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dc.creatorGong, Cuiling
dc.creatorHogan, Tim
dc.date.accessioned2019-11-08T18:59:25Z
dc.date.available2019-11-08T18:59:25Z
dc.date.issued2014-03-17
dc.identifier.urihttps://doi.org/10.1109/JEDS.2014.2309129
dc.identifier.urihttps://repository.tcu.edu/handle/116099117/35792
dc.identifier.urihttps://ieeexplore.ieee.org/document/6774433
dc.description.abstractDLP® technology has been widely used in the display products since it was first introduced to the world in 1996 by Texas Instruments. Projectors powered by DLP® technology range from cinema projectors that light up large movie theater screens to palm-sized "Pico" projectors. The heart of the technology is the digital micromirror device (DMD) that features an addressable array of up to 8 million microscopic mirrors. DMDs are fabricated using standard semiconductor processing equipment. However due to the unique nature of MOEMS application and digital operation of the DMDs, special CMOS-compatible fabrication processes have been developed to produce highly reflective digital micromirrors with robust operation margin and long term reliability. This paper will present an overview of the fabrication processes of the DMDs
dc.language.isoenen_US
dc.publisherIEEE
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.sourceIEEE Journal of the Electron Devices Society
dc.subjectMicroelectromechanical devices
dc.subjectspatial light modulators
dc.subjectfabrication
dc.subjectDMD
dc.subjectDLP
dc.titleCMOS Compatible Fabrication Processes for the Digital Micromirror Device
dc.typeArticle
dc.rights.holder2014 IEEE
dc.rights.licenseCC BY 4.0
local.collegeCollege of Science and Engineering
local.departmentEngineering
local.personsGong (ENGR)


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